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Brand Name : Jinxing
Model Number : TiAl Ti75Al25 Round Bar For Sputtering
Certification : ISO 9001:2008
Place of Origin : China
MOQ : 10kgs
Price : 10-100USD/kg
Payment Terms : L/C, T/T
Supply Ability : 10ton month
Delivery Time : 10days
Packaging Details : Standard exporting package
Purity : Al-Ti (35/65at%), Al/Ti (50:50 at%)
Shape : Discs, Plate, Step
Specification : Customized as request
Process : HIP
Name : Ti75Al25 Round Bar For Sputtering
Ti75Al25 Round Bar For Sputtering
TiAl Target 75:25
Product Name: Titanium Aluminum target 75:25 at%
Titanium Aluminum 75:25 at%
TiAl targets are produced in a meltmetallurgical process.
Application
Ti75Al25 Round Bar For Sputtering are used for wear resistant coatings, e.g. cutting tools.
Purity
Metallic purity ≥ 99.8%
Composition ratio
75:25 at%
Form of Delivery
Sputtering targets, arc cathodes, round targets up to ? 220 mm in one segment, rectangular targets up to a length of 1100 mm and a width of 200 mm in one segment.
Chemical Analysis in wt%
Fe <0.07
C <0.03
O <0.15
N <0.03
H <0.01
Tolerance of Al and Ti +/- 1 wt%
Physical Properties
Melting point: 1620°C
Density supplied: ≥ 4.18 g/cm3
Ti75Al25 Round Bar For Sputtering Picture:
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HIP Process Ti75Al25 Titanium Aluminum Round Bar For Sputtering Images |